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[NativeCPU] Remove align in mask load/store after 573ca63
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llvm/lib/SYCLNativeCPUUtils/compiler_passes/vecz/source/vector_target_info.cpp

Lines changed: 2 additions & 2 deletions
Original file line numberDiff line numberDiff line change
@@ -506,7 +506,7 @@ Value *TargetInfo::createMaskedGatherLoad(IRBuilder<> &B, Type *Ty, Value *Ptr,
506506
Mask = applyEVLToMask(B, EVL, Mask);
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VECZ_FAIL_IF(!Mask);
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// Create the call to the function
509-
Value *Args[] = {Ptr, B.getInt32(Alignment), Mask,
509+
Value *Args[] = {Ptr, Mask,
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PoisonValue::get(Ty)};
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CallInst *CI = B.CreateCall(MaskedGather, Args);
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if (CI) {
@@ -607,7 +607,7 @@ Value *TargetInfo::createMaskedScatterStore(IRBuilder<> &B, Value *Data,
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Mask = applyEVLToMask(B, EVL, Mask);
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VECZ_FAIL_IF(!Mask);
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// Create the call to the function
610-
Value *Args[] = {Data, Ptr, B.getInt32(Alignment), Mask};
610+
Value *Args[] = {Data, Ptr, Mask};
611611
CallInst *CI = B.CreateCall(MaskedScatter, Args);
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if (CI) {
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CI->setCallingConv(MaskedScatter->getCallingConv());

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